3D激光共聚焦形貌顯微鏡特點
-高分辨率無損光學三維測量
-實時共焦成像
-各種光學變焦
-同時亮場和共焦成像
-具有精細自動聚焦的自動增益搜索
-傾斜補償
-簡易分析模式
-精密可靠的高速測高
-通過半透明基板檢查特征
-無樣品制備
-寬范圍檢測的圖像拼接
3D激光共聚焦形貌顯微鏡應用
-半導體:IC圖形,凸點高度,線圈高度,缺陷檢查,CMP工藝
-FPD產(chǎn)品:觸摸屏檢查,ITO圖案,LCD柱墊高度
-MEMS器件:結(jié)構(gòu)的三維輪廓,表面粗糙度,MEMS圖形
-玻璃表面:薄膜太陽能電池,太陽能電池紋理,激光圖案
-材料研究:模具表面檢查,粗糙度,裂紋分析
3D激光共聚焦形貌顯微鏡測量表面粗糙度
3D激光共聚焦形貌顯微鏡規(guī)格參數(shù)
型號 | 顯微鏡 | NS-3600 | Remark | |||
---|---|---|---|---|---|---|
物鏡放大倍數(shù) | 10× | 20× | 50× | 100× | ||
觀察/ 測量范圍 | 水平 (H): μm | 1400 | 700 | 280 | 140 | |
豎直 (V): μm | 1050 | 525 | 210 | 105 | ||
工作距離: mm | 17.5 | 4.5 | 1.0 | 1.0 | ||
數(shù)值孔徑 (N.A.) | 0.30 | 0.45 | 1.0 | 1.0 | ||
觀察/測量的光學系統(tǒng) | 小孔聚焦光學系統(tǒng) | |||||
Height Measurement | Measuring scan range | 10 mm | ||||
Display resolution | 0.001 µm | |||||
Repeatability σ | 0.02 µm | Note 1 | ||||
Width measurement | Display resolution | 0.001 µm | ||||
Repeatability 3σ | 0.03 µm | Note 2 | ||||
Frame memory | Pixel count | 1024x1024, 1024×768, 1024×384, 1024×192, 1024×96 | ||||
For confocal image | 12 bit | |||||
For color image | 8-bit for RGB each | |||||
For height measurement | 16 bit | |||||
Frame rate | Surface scan | 20 Hz to 160 Hz | ||||
Line scan | ~8 kHz | |||||
Laser beam light source for confocal measurement | Wavelength | Red laser, 638 nm | ||||
Output | ~2 mW | |||||
Laser Class | Class 3b | |||||
Laser light-receiving element | PMT (photomultiplier tube) | |||||
Light source for optical observation | Lamp | LED | ||||
Color camera for Optical observation | Imaging element | Color CCD image sensor | ||||
Recording resolution | 1296x966 | |||||
Data processing unit | Dedicated PC | |||||
Power supply | Power-supply voltage | 100 to 240 VAC, 50/60 Hz | ||||
Current consumption | 500 VA max. | |||||
Weight | Microscope | Approx. ~50 kg (Measuring head unit : ~12.5 kg) | ||||
Controller | ~8 kg | |||||
Vibration isolating system | Pneumatic isolator |
- Note 1 :
100 times measurement of standard sample (1µm step height) with 100× / 0.9 objective.
- Note 2 :
100 times measurement of standard sample (5µm pitch) with 100× / 0.9 objective.